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TSMC and Synopsys Expand Cooperation to 16 nm

Published: Dec 05,2013

【Taipei , Taiwan】 Synopsys announced Laker custom design solutions have adopted by TSMC 16 nm FinFET Design Rule Manual (DRM) 0.5 version certification, and will also be included in the TSMC 16 nm interoperable process design kit ( iPDK) .

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Laker can support iPDK standard effectively, providing the user a wide range of TSMC process technology ( from 180 nm to 16 nm ) . In addition to support for TSMC's 16 nm V0.5 iPDK addition , Laker tool also allows users to take full advantage of FinFET technology.

For 16 nm layout , the enhancement of Laker includes a new feature set designed for FinFET device , which contains FinFET fin grid pattern snapping, fin display, as well as interactive FinFET rule checking . Laker improved the built-in double pattern checks , support pre-coloring and color density check. Laker also support middle layer of MEOL, including contactless connectivity, unidirectional layer, and 16 nm guard ring.

In addition , Laker also support for continuous diffusion (CNOD) of TSMC 's 16 nm V0.5 iPDK , and the abutment rules of poly over diffusion edge (PODE).

Suk Lee , Director of Design Infrastructure Marketing Division at TSMC , said: " Over the years, Synopsys has been a partner of the TSMC’s Open Innovation Platform , the certification for Synopsys Laker Custom Design Solutions Technology representing TSMC and Synopsys will use 16 nm FinFET technology to provide services for our customers . "

Bijan Kiani , vice president of product marketing at Synopsys , said: " Synopsys and TSMC worked closely to develop 16 nm technology, ready by previous SPICE model development and collaboration with Synopsys IP team. Launched Laker custom design solutions, we will fully support the TSMC 16 nm technology and its users . "

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