Currently, the majority of semiconductor solution monitoring technologies are only capable of carrying out analyses of particles which are 20nm and above in size, and they are helpless when it comes to analyzing particles that are smaller than 20nm. However, ITRI has conducted R&D on a “Solution Particle Monitor,” which can be used to continually monitor the sizes and concentrations of chemical solutions such as grinding fluids, IPA, hydrogen peroxide, and ultra-purified water 24-hours a day, and it can be used to measure tiny particles in ranges as small as 5-1,000nm.

In addition, when manufacturing high-precision RDL circuit board lines, it is necessary to utilize metal etching solutions to carry out pattern processing. However, the majority of metal etching solutions are highly corrosive and destructive and must be matched up with protective photoresistant materials in order to ensure the integrity of etching lines. The “protective material of photoresist” developed by ITRI has low viscosity and etching liquid properties, and it can be sprayed on Line/Space≦5μm in order to achieve the objective of protecting large areas (≧50-inches).

This photoresistant protective material can withstand more than fifty times of reuse in metal etching solutions in order to attain optimal protective effects. In addition, it can be used in solar metal shielding, touch panel metal wires, and OLED panel TMA manufacturing applications.

(TR/ Phil Sweeney)