Dr. Chung-Xing Bao, the associate research fellow of the NCKU’s Center for Micro/Nano Science and Technology, gathering facility and technology energies all at once.

Starting from this date, iST engages a 3-shift operation 24 hours a day, for the overall shortening of lead-time and a giant leap in productivity, manifesting the determination for breakthroughs in the realm of material analysis, providing customers with prompt and high-end MA services.

For rewarding loyal customers, iST offers 50% discount on TEM Observation service starting from now until June 30th.

Observing the marketplace, iST finds that enterprises are striving to accomplish semiconductor components with higher efficiency, lower power consumption and more compact configuration that meet the requirements of today’s smart products.

Major manufacturers are gaining speed in developing more advanced processes which include Intel who has first launched massive production of the 22nm process. TSMC and Samsung have entered a massive 20nm production, and UMC has directly entered the development of the 14nm process, a jump from the 28nm bypassing the 20nm.

Dr. Sheng-Yu Chen, MA Manager of iST, explains that material configuration and element analysis capabilities are key factors in determining whether a semiconductor process development is achievable, especially when entering the generation of under 28nm. The traditional analytical instruments are facing a bottleneck; the only analytic solution will be TEM, which is capable of delivering the atomic-class resolution.

In addition to semiconductor applications, MA also plays an important role in the LED industry. The most critical epitaxial process that determines LED luminance is highly dependent on TEM for controlling process parameters.

Sheng-Yu Chen further notes that in all TEM applications, the demands for EDS element analysis are getting stronger nowadays. iST has recently introduced the highest level TEM equipment, JEOL’s JEM-2800, which comes together with 2 EDS detectors, each with a super large area of 100mm2, giving a total signal reception area of 200mm2, far exceeding performances of previously top-class models in the industry (with a signal reception area of 120 mm2). Thus it becomes an ideal helper in the future for dealing with process difficulties of customers.

“iST has successively accomplished the analytic samples of industrial customers including renowned wafer manufacturers and LED epitaxy plants breaking through to the 14nm processes. Customers are highly satisfied with the outcome.” Says Sheng-Yu Chen.

According to Chairman Wei-Bin Yu, iST has actively expanded the MA battlefront for the pursuit of the-state-of-the-art capabilities for process certification, marching high to make all preparations for meeting customer needs, expecting it to be the most important partner of customers who are greeted with their successes.