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ITRI Showcases a Thin Film Metrology System at SEMICON
By Vincent Wang
Published: Sep 03,2015
ITRI’s thin film metrology system for semiconductor process showcases at 2015 SEMICON Taiwan
TAIPEI, Taiwan — The Industrial Technology Research Institute (ITRI) showcased a thin film metrology system for semiconductor process at 2015 SEMICON Taiwan. In the system, it can measure the parameters of film thickness, the refractive index of materials value and through silicon via (TSV) depth.
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Finding ways to measure the parameters of film thickness, the refractive index of materials value and through silicon via (TSV) depth is important in the semiconductor process.
The spectral reflectometer (SR) is a method of characterizing unknown properties of a sample by measuring the reflection of electromagnetic radiation. A broadband light source is focused onto a sample with low numeral aperture (NA).
Then, the reflected light is collected onto the spectrometer and transfer into spectrum signals. After the theoretical analysis and signature fitting, the parameters of the sample can be obtained. In the system, it can measure the parameters of film thickness, the refractive index of materials value and through silicon via (TSV) depth.
Additionally, ITRI forecast the local semiconductor industry would post NT$2.25 trillion (US$68.68 billion) in revenue this year, up 2 percent from last year’s NT$2.2 trillion.
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